| abstract |
The impurity diffusion composition of the present invention contains (A) a polyoxyalkylene represented by the formula (1) and (B) an impurity diffusion component.n□ (wherein R1 represents an aryl group having 6 to 15 carbon atoms, and a plurality of R1's may be the same or different. R2 represents a hydroxyl group, a carbon number of 1 to an alkyl group having 6 carbon atoms, and a carbon number of 1 to carbon number. 6 alkoxy group, carbon number 2 to carbon number 10 alkenyl group, carbon number 2 to carbon number 6 fluorenyl group, carbon number 6 to carbon number 15 aryl group, a plurality of R2 may be the same, R3 and R4 represent a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, and a carbon number of 2 to carbon. 6 of the thiol groups, a plurality of R3 and R4 may be the same or different. n: m = 95: 5 ~ 25: 75)nThe present invention provides an impurity diffusion composition which has excellent printability and impurity diffusibility to a semiconductor substrate, and is less likely to be cracked in a calcination or diffusion step, and is sufficient for other impurity diffusion agents after calcination. A opaque calcined film. |