http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201501202-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32366
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31105
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 2014-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0bba7613c31bf8577906596a1105d313
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f21328f2e67f0ba1b8c2d06b5bd8cce7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32947677054e41fcac415a319cc2cfc6
publicationDate 2015-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201501202-A
titleOfInvention Plasma etching method and plasma etching device
abstract A plasma etching method is provided which can obtain a good etching shape.nA plasma etching method is a plasma etching method for plasma etching a target object including an etching target film and a patterned mask, wherein the first step is to use a mask to etch the paste In the second step, at least a part of the side wall portion of the etching target film etched by the first step is used to deposit a ruthenium-containing film with a plasma containing ruthenium gas.
priorityDate 2013-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419530175
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID123105
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426015070
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID167109
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411556313
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23950
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546203
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23992
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559581
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10039
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448078973
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546360
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411303255
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577457
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID37715
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23987
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11638
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID4092293
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419558793
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID432477
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID297
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415964938
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577374

Total number of triples: 48.