| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45527
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02219
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-402
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02312 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
| filingDate |
2014-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3f1ba247ae0855045a6f81e40d10cde
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0bbbb362eb948eb62a1ab5fccf80f9c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4f24a88f2be5e6ed2557eebc5a63d84 |
| publicationDate |
2014-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201447017-A |
| titleOfInvention |
Method for forming ruthenium oxide film and device for forming ruthenium oxide film |
| abstract |
The method for forming a tantalum oxide film according to the present invention is to perform a combination of the following steps: a standby step of accommodating/recycling the object to be processed into the wafer boat; and a loading step of processing the contained in the wafer boat The body is housed in the reaction chamber; the ruthenium oxide film forming step is formed by forming a ruthenium oxide film on the object to be processed contained in the reaction chamber; and an unloading step of transporting the object to be processed having the ruthenium oxide film to the reaction outdoor. In at least one of the unloading step, the standby step, and the loading step, the reaction chamber is heated, and a gas containing water vapor is supplied into the reaction chamber. |
| priorityDate |
2013-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |