| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32899
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2014-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d234124be7e513dda348c4f8808368e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5279bc0ae1450de664f316da3f097499
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97ef9f0d4c96e36c6d054022e6d58580 |
| publicationDate |
2014-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201438103-A |
| titleOfInvention |
Semiconductor processing system having multiple plasma configuration members |
| abstract |
An exemplary system can include a chamber configured to contain a semiconductor substrate in a processing region of the chamber. The system can include a first distal plasma unit coupled to the first inlet of the chamber and configured to transfer the first precursor into the chamber via the first inlet. The system can still further include a second distal plasma unit coupled to the second inlet of the chamber and configured to transfer the second precursor to the chamber via the second inlet . The first inlet and the second inlet may be fluidly coupled to the mixing region of the chamber, the mixing region being fluidly coupled to the processing region of the chamber and to the processing region. The mixing zone can be configured to allow the first precursor and the second precursor to interact with each other outside of the processing region of the chamber. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10920319-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I759741-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109155242-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I776107-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I795404-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I721342-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I732777-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10903054-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11591693-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11581165-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111492469-A |
| priorityDate |
2013-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |