| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45523
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02263
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02219
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-402
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2013-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c77499bb17a75c6266165e6de69f06b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75a31e4069470bd27196e08b0bf6dd19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8217425e6b8f2718627265ddb3d68e0b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_517325efaff45299daeab3275e98a475
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4cf16caf9fe22a7b729596f74a327a2e |
| publicationDate |
2014-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201432781-A |
| titleOfInvention |
Substrate processing apparatus, lid body, and method of manufacturing the same |
| abstract |
[Problem] For a substrate processing apparatus having a plurality of processing regions, a substrate processing apparatus that can cope with each processing region when processing time is different is provided. [Means for Solving the Problem] The substrate processing apparatus which solves the above-mentioned problem is provided with the board|substrate mounting part provided in the processing chamber, and the board|substrate mounting part which can mount the board|substrate in the circumferential- The rotation mechanism is radially provided from a center of the lid of the processing chamber, and divides the processing chamber into a plurality of divided structures and gas supply regions respectively disposed between the adjacent divided structures. An angle formed by the adjacent divided structure that is one of the gas supply regions is a substrate processing device that sets a time when a part of the substrate mounting portion passes through the gas supply region and an angle corresponding to the angular velocity. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106024564-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106024564-B |
| priorityDate |
2012-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |