| abstract |
A slurry-resistant member according to the present invention, comprising: a substrate; a surface layer formed on the surface of the substrate, comprising a layer structure having plasmonic oxide polycrystal having a plasma resistance, the layer structure having: a first unevenness a structure in which the first uneven structure is superposed on the first uneven structure, and has a second uneven structure having finer irregularities than the first uneven structure. The adhesion strength or adhesion of the coating film covering the inner wall of the reaction chamber can be increased, or the particles can be reduced. |