http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201417168-A

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filingDate 2012-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8587f1dfced9522c8da951b8461280f6
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publicationDate 2014-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201417168-A
titleOfInvention Gas shower head for plasma processing chamber and coating forming method thereof
abstract The present invention discloses an enhanced coating for a gas showerhead for a plasma processing chamber. The reinforced coating is formed using plasma enhanced physical vapor deposition. The formation of the coating includes a physical process that concentrates the source material on the surface of the gas showerhead, and a chemical process in which the active component of the plasma reacts with the concentrated source material. Also, non-reactive components in the plasma bombard the surface of the gas showerhead to make the coating more compact.
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