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publicationDate 2013-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201340203-A
titleOfInvention Semiconductor device manufacturing method
abstract The present invention relates to a method of fabricating a semiconductor device, comprising the steps of: forming a film, forming a tantalum nitride layer or a hafnium oxide layer, so that the tantalum nitride layer or the hafnium oxide layer is coated on the substrate and patterned. a sidewall portion of the germanium layer; and a plasma etching step of selectively removing the germanium-containing layer leaving a tantalum nitride layer or a tantalum oxide layer formed on the sidewall portion; and using an etching gas containing SF6 gas in the plasma etching step .
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