http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201311882-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e4c608a8531ea588aab7e23318e09a77 |
classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-04 |
filingDate | 2011-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba86adbeddf7c855147da9a3b6df5f0c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53af2eb49c29cfeb66450fa31ad3f40f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0161d5dd119cef93669a2588445c0204 |
publicationDate | 2013-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-201311882-A |
titleOfInvention | Fluorine-containing cleaning solution |
abstract | The invention discloses a semiconductor industry fluorine-containing cleaning liquid having a low bismuth oxynitride etching rate, and the cleaning liquid composition comprises: □ the cleaning liquid composition of the invention can effectively clean the medium ion etching residue in the semiconductor manufacturing process, At the same time, for substrates such as low dielectric materials (SiO2, PETEOS) and some metal materials (such as Ti, Al, Cu), etc. have a lower etching rate; in particular, the bismuth oxynitride etch rate is lower, thereby further expanding the fluorine cleaning The cleaning operation window of the liquid further improves the service life of the fluorine-containing cleaning liquid and reduces the operating cost of the semiconductor factory, and has a good application prospect in the field of microelectronics such as semiconductor wafer cleaning. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106675811-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109501015-A |
priorityDate | 2011-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 129.