http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201310534-A

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filingDate 2011-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5720112c3192d045a3bba428926c28a6
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publicationDate 2013-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201310534-A
titleOfInvention Method for forming conductor pattern
abstract A method of forming a conductor pattern is provided. A seed layer is formed on the bottom layer. A portion of the surface of the seed layer is irradiated with energy rays such that the seed layer includes a plurality of irradiated regions and a plurality of unirradiated regions. The irradiated area of the seed layer is subjected to a transformation treatment. A selective growth process is performed to grow the conductor pattern on the unirradiated areas of the seed layer. The irradiated regions of the seed layer are removed to electrically insulate the conductor patterns from each other.
priorityDate 2011-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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