http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201308483-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0aba914b6a3119aa17edde3a1f67d3f9 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-86485 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45561 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-448 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4485 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate | 2012-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cbac4f03e2ee1c8dd685b93bce28db6d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b42246b99da77e3a50b63b71f7776a02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_825b3bd6279fab467d729c5d5b6728d4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa373845306c8fdb83cfed1cbf1a8834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc99879e45f7938472805d137357054e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_558ddd3334d1743e8ad9e16860682ff9 |
| publicationDate | 2013-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201308483-A |
| titleOfInvention | Raw material gas supply device for semiconductor manufacturing equipment |
| abstract | It is possible to achieve high-precision flow control of the vapor of the liquid material gas, that is, the material gas, without using the carrier gas, and to stably supply the process to the process chamber, and at the same time, the structure of the material gas supply device can be achieved. And miniaturization. The liquid material gas supply source; the source storage tank for storing the liquid material gas; and the gas flow path for supplying the liquid material gas vapor, that is, the material gas, to the process from the inner upper space portion of the source storage tank a chamber; an automatic pressure regulator disposed on the flow side of the gas flow path for maintaining a supply pressure of the material gas supplied to the process chamber at a set value; and a supply gas switching valve disposed in the gas flow path a lower flow side for switching a passage for supplying a raw material gas to the process chamber; and a hole portion provided at at least one of an inlet side and an outlet side of the supply gas switching valve for adjusting supply to the process chamber a flow rate of the raw material gas; and a constant temperature heating device for heating the source storage tank, the gas flow path, the supply gas switching valve and the hole portion to a set temperature; and supplying the raw material gas of the flow side of the automatic pressure regulator While controlling to become the desired pressure, the raw material gas of the set flow rate is supplied to the process chamber. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11482409-B2 |
| priorityDate | 2011-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.