| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76826
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate |
2011-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c6bb29fdb914150994579856e5914a8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3dde0112a885e960a22e6c3d10dc8b59
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2f62939a7bbbc3774c59b0da478fa53
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef8cf4cd33d98fa4ec1254657b946c03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6821b114703cdc7e5748b2e7c4849ff3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25d0b61a467bbffe39ff707047653338 |
| publicationDate |
2012-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201232660-A |
| titleOfInvention |
Methods of processing low k dielectric films |
| abstract |
Provided are methods for re-incorporating carbon into low-k films after processes which result in depletion of carbon from the films. Additionally, methods for replenished depleted carbon and capping with tantalum nitride are also described. |
| priorityDate |
2010-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |