abstract |
A hard mask composition including an aromatic ring-containing compound represented by the following Chemical Formula 1 and a solvent are provided. In Chemical Formula 1, each A, R1 to R6, X1 to X6, n1 to n6 are the same as defined in the detailed description. Also, a method for forming a pattern by using the hard mask composition and a semiconductor integrated circuit device including a plurality of patterns formed through the pattern-forming method are provided. |