http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201209911-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dc3e639586089fe232d0cfb27383c875 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3342 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
filingDate | 2011-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0493f7e347e8d115375b370d2280e67d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_834862c892122e31a814c25049166c6d |
publicationDate | 2012-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-201209911-A |
titleOfInvention | Substrate etching method and sapphire substrate manufacturing method |
abstract | The present invention provides a substrate etching method that could increase the etching selectivity of substrate against organic resist, and a sapphire substrate manufacturing method. One implementation form of the substrate etching method of the present invention is to etch aluminium compound substrate progress by forming hydrocarbon-containing plasma. On the other hand, the aforementioned substrate etching method is to deposit the aforementioned hydrocarbon-based reactant obtained from plasma on resist, to suppress the progress of etching of resist. Therefore, according to aforementioned substrate etching method, the etching selectivity of substrate against resist can be increased because of the etching rate can be reduced, and fine convex-concave patterns can be formed on the surface of substrate even without forming the resist thickly. |
priorityDate | 2010-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.