http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201209192-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9d7b3203562ac08753c18fd253d61449 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01F1-068 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-14 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3414 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3429 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01F41-183 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3426 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-851 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06 |
| filingDate | 2011-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee590a96cc04c5c0bab27a722d6b6dee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d90eb3d7cc3c4fcf180e1db28e469b2 |
| publicationDate | 2012-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201209192-A |
| titleOfInvention | Fe-Pt based strong magnetic material sputtering target |
| abstract | Disclosed is a Fe-Pt based strong magnetic material sputtering target composed of metal oxides and a metal made by Pt of more than 5 mol% and less than 60 mol% and Fe as the remainder. The subject of this invention is to provide a strong magnetic material sputtering target which has a magnetic recording layer composed of a magnetic phase of Fe-Pt alloy etc. and a non-magnetic phase for separating it and uses metal oxides as the material of the non-magnetic phase, so as to provide a strong magnetic material sputtering target which can inhibit accidental disengagement of metal oxides during sputtering, prevent particles generation caused by abnormal electric discharge of using the interspace contained in the target as the start point, promote the tightness of metal oxides and the base alloy and further increase the density of the sputtering target. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I564416-B |
| priorityDate | 2010-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 41.