Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f7a85d730847339e0c2e621c6c6fd96e |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F15-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-406 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-314 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F15-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18 |
filingDate |
2010-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6dfb13e102ac6892592a40dea22b8985 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a2efcdcd695024fb1a6e1ac962f7e27 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d852b2012ee3286044d653d0d1147d58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_912134915cebbef2cbfbec8f61c5513e |
publicationDate |
2011-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201120233-A |
titleOfInvention |
High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films |
abstract |
A method for forming a cobalt-containing thin film by a vapor deposition process is provided. The method comprises using at least one precursor corresponding in structure to Formula I: wherein R1 and R2 are independently C2-C8-alkyl; x is zero, 1 or 2; and y is zero or 1; wherein both x and y can not be zero simultaneously. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I759461-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11355345-B2 |
priorityDate |
2009-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |