http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201114935-A

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filingDate 2010-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abaa9e8d2cabff8352bdb6d99543e0d2
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publicationDate 2011-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201114935-A
titleOfInvention Sputtering system, rotatable cylindrical target assembly, backing tube, target element and cooling shield
abstract The application concerns a target backing tube for a rotatable cylindrical target assembly comprising: a tube for at least one target element to be disposed there around, wherein the tube has an exterior surface adapted to face the at least one target element, wherein a portion of the exterior surface of the tube has a mean emissivity of 0.7 to 1, wherein the portion is at least 50% of the exterior surface of the tube. Further, the application concerns a cooling shield for a sputtering system comprising a rotatable target, the cooling shield has an interior surface adapted to face a target element of a sputtering system and an exterior surface; wherein a portion of the interior surface of the cooling shield has a mean emissivity of 0.7 to 1, wherein the portion is at least 50% of the interior surface of the cooling shield. Additionally, the application concerns a target element for a rotatable cylindrical target assembly of a sputtering system, wherein the target element has an interior surface adapted to face a target backing tube onto which the target cylinder is adapted to be disposed and exterior surface, wherein a portion of the interior surface of the target element has a mean emissivity of 0.7 to 1, wherein the portion is at least 50% of the interior surface of the target element.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I619561-B
priorityDate 2009-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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