| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2f8cfa5aee4410611b5c562275c9f8e3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F6-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2010-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d292904b92dd2b1563d20c9f4ee829c2 |
| publicationDate |
2011-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201100448-A |
| titleOfInvention |
Process for producing photoresist polymeric compounds |
| abstract |
Provided is a polymer compound for photoresist containing an extremely small amount of metal component, especially Na and Fe. The present invention provides a producing method of polymer compound for photoresist comprising a step that a solution containing a polymer is passed through a filter consisted of a porous film having anion-exchange-group and then passed through a filter consisted of a porous film having cation-exchange-group; in which the polymer is obtained from polymerizing a monomer mixture comprising at least one monomer selected from (a) a monomer containing a group which detaches by an acid to thereby becomes alkali-soluble, (b) a monomer containing lactone skeleton and (c) a monomer containing an aliphatic cyclic skeleton having hydroxyl group. Preferably, the metal containing amount in the polymer solution passed through the filter consisted of a porous film having cation-exchange-group is 1000ppb or less in relative to the polymer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110337458-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110337458-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I724052-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I740805-B |
| priorityDate |
2009-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |