| abstract |
Disclosed is a vacuum processing apparatus capable of performing vacuum process such as etching process and deposition process for substrate including glass for liquid crystal display (LCD) panel. The vacuum processing apparatus comprises a cover member closely-coupled to at least a part of an inner surface of the vacuum chamber, and having a coating layer including one of W, Ni, W-N, Cr and Mo thereon; and/or a shielding member detachably installed at a space between a side surface of the substrate supporting unit and an inner surface of the vacuum chamber for shielding the space, and having a coating layer including one of W, Ni, W-N, Cr and Mo on a surface thereof. |