http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200917910-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0efaa4434888f398769d05b8bad48942 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45519 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32495 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-402 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-505 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505 |
| filingDate | 2008-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b99d21d2703a5ab013d4195dfc9add53 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8248f0d6fecc3d87d3e6bed6201084c0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79fb349147709556ab1d13dd614d71c9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97d5ced4725b795628785821cea4afaf |
| publicationDate | 2009-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200917910-A |
| titleOfInvention | Plasma processing apparatus |
| abstract | A plasma processing apparatus is provided with a substrate stage whereupon a substrate to be processed is arranged; a plasma generating section for generating plasma by using an antenna array; a gas radiating section having a gas radiating plate which is arranged above the antenna array and has a plurality of gas radiating ports; a first gas supply section, which supplies the first material gas by radiating the gas from some of the gas radiating ports on the gas radiating plate toward the surface of the substrate stage so that the gas passes over the surface of the antenna element; and a second gas supply section, which supplies a second material gas by radiating the gas from other gas radiating ports among the gas radiating ports on the gas radiating plate toward the surface of the substrate stage so that the gas passes through a space between the antenna elements.; When the first material gas is exposed to the antenna element, the first material gas does not generate an attaching material or generates a smaller quantity of the attaching material compared with a case where a second material gas is used. Thus, film forming speed can be improved and generation of particles can be suppressed. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I602213-B |
| priorityDate | 2007-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6517 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419555680 |
Total number of triples: 27.