| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate |
2008-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2897c0aaa24a7a1137b2142584ed39e9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_185a59569550cc953146c98b8101ca54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ebea677d7e5bde02dd998522e23ca61f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_957ef0b677d29ee7a61ef8c0af8d1d30 |
| publicationDate |
2009-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200911972-A |
| titleOfInvention |
Aqueous dispersion for chemical mechanical polishing and method for preparing the same, kit for preparing aqueous dispersion for chemical mechanical polishing, and chemical mechanical polishing method for semiconductor device |
| abstract |
Disclosed is an aqueous dispersion for chemical mechanical polishing, which contains a water-soluble polymer (A) having a sulfonic acid group, an amino acid (B), abrasive grains (C) and an oxidizing agent (D). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110312776-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110312776-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105612236-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113412322-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105612236-B |
| priorityDate |
2007-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |