| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0206
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32541
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-0035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 |
| filingDate |
2008-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15e630c0580a0d459c86f7f4f373513f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64baacc8cdd5502de2395182a64219eb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb3d5536b6b26fdeae84b01159725982
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04a38889005ec39eee8bae72b916460a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e743ca7dc2c899916f65713022806219
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6e8275c42ee30c35333269ddace4740
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_16188c77e1e30468857aca46f3dcf194 |
| publicationDate |
2009-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200903600-A |
| titleOfInvention |
Substrate cleaning chamber and cleaning and conditioning methods |
| abstract |
A substrate cleaning chamber includes a contoured ceiling electrode having an arcuate surface that faces a substrate support and has a variable cross-sectional thickness to vary the gap size between the arcuate surface and the substrate support to provide a varying plasma density across the substrate support. A dielectric ring for the cleaning chamber comprises a base, a ridge, and a radially inward ledge that covers the peripheral lip of the substrate support. A base shield comprises a circular disc having at least one perimeter wall. Cleaning and conditioning processes for the cleaning chamber are also described. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I633573-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I718674-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I749301-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I619162-B |
| priorityDate |
2007-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |