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publicationDate 2008-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200845191-A
titleOfInvention Etching method and recording medium
abstract Provided is an etching method wherein a fluorine-added carbon film formed on a substrate is etched by plasma. The method includes a first step of performing etching with plasma of an oxygen-containing treatment gas, and a second step of performing etching with plasma of a fluorine-containing treatment gas.
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