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filingDate 2006-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_98994567599570c209b47dc8dd955695
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publicationDate 2008-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200813250-A
titleOfInvention Apparatus and process for surface treatment of substrate using an activated reactive gas
abstract An apparatus and process for treating at least a portion of the surface of a substrate is described herein. In one aspect, the apparatus a processing chamber comprising an inner volume, the substrate, and an exhaust manifold; an activated reactive gas supply source wherein a process gas comprising one or more reactive gases and optionally an additive gas is activated by one or more energy sources to provide the activated reactive gas; and a distribution conduit, which is in fluid communication with the inner volume and the supply source, comprising: a plurality of openings that direct the activated reactive gas into the inner volume, wherein the activated reactive gas contacts the surface and provides a spent activated reactive gas and/or volatile products that are withdrawn from the inner volume through the exhaust manifold.
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