| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2004-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8c71d33c77b0cfbfdbf78e05c311a43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0873750b5ddc9495ae3ba37e6c13c1a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4e9dcc80f99f35112ee865290b52061
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13814e23073e22d9eecdc7fb7d640788
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2be4271ec0ed9b77361913d27c6916a5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_104f8a4efa34b5013135a0ce16f7edb5 |
| publicationDate |
2004-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200426514-A |
| titleOfInvention |
Resist composition for liquid immersion exposure process and method of forming resist pattern therewith |
| abstract |
This invention provides a resist composition for liquid immersion exposure process, comprising a polymer (A) whose alkali solubility is changed by the action of an acid, the polymer (A) comprising alkali soluble structural units (a1) containing an alicyclic group having a fluorine atom or fluorinated alkyl (i) together with an alcoholic hydroxyl (ii), and comprising an acid generator (B) capable of generating an acid when exposed to radiation. There is further provided a method of forming a resist pattern therewith. These enable avoiding any adverse effects of immersion liquid while realizing high resolution and focal depth. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8715902-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9696622-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9563128-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I454844-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I602019-B |
| priorityDate |
2003-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |