| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76897
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-60 |
| filingDate |
2002-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09563d7124b33607f965fef78e465df5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_432d091843cf964b1cad4fd39e26a842
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa51e810df31f37f3f0c3ca4a6a63762
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ae8709e57c90960481686c9027cb3cd2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d7d18590705bbf3a0db20db78c9c29e |
| publicationDate |
2003-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200305947-A |
| titleOfInvention |
Self-aligned contact etch with high sensitivity to nitride shoulder |
| abstract |
A method and apparatus are provided for etching semiconductor and dielectric substrates through the use of plasmas based on mixtures of a first gas having the formula CaFb, and a second gas having the formula CxHyFz, where a/b ≥ 2/3, and wherein x/z ≥ 1/2. The mixtures may be used in low or medium density plasmas sustained in a magnetically enhanced reactive ion chamber to provide a process that exhibits excellent comer CD control. The percentages of the first and second gas may be varied during etching to provide a plasma that etches undoped oxide films or to provide an etch stop on such films. |
| priorityDate |
2001-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |