http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-970008369-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32165 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32623 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 |
| filingDate | 1996-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1997-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-970008369-A |
| titleOfInvention | Plasma Etching Equipment Using Plasma Confinement |
| abstract | The plasma etching apparatus includes a stack of quartz rings spaced apart to form slots between the rings and disposed to surround the interaction space between the two electrodes of the apparatus in which the plasma is formed while the apparatus is in operation. The size of the slot is neutralized by collision with the wall as the charged particles of gas consumed in the plasma exiting the interaction space exit the slot. Voltage sources of different frequencies are used to apply voltage to the electrodes in a form that isolates each voltage source from each other. |
| priorityDate | 1995-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261 |
Total number of triples: 20.