http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-960015781-A

Outgoing Links

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32559
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23Q3-15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
filingDate 1995-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 1996-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-960015781-A
titleOfInvention Plasma Guard for Chambers with Electrostatic Chokes
abstract The plasma guard member, which has a flat concentric ring shape, surrounds the choke choke to prevent charged particles from floating or diffusing into the lower chamber and contacting the electrostatic choke so that the substrate supporting ability of the plasma reaction chamber and plasma source and choke is not reduced. Used in vacuum processing chambers with lower chambers.
priorityDate 1994-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 26.