Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32559 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32623 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23Q3-15 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
filingDate |
1995-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
1996-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-960015781-A |
titleOfInvention |
Plasma Guard for Chambers with Electrostatic Chokes |
abstract |
The plasma guard member, which has a flat concentric ring shape, surrounds the choke choke to prevent charged particles from floating or diffusing into the lower chamber and contacting the electrostatic choke so that the substrate supporting ability of the plasma reaction chamber and plasma source and choke is not reduced. Used in vacuum processing chambers with lower chambers. |
priorityDate |
1994-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |