http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-960008971-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32678 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-511 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32192 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J3-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-511 |
| filingDate | 1995-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1996-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-960008971-A |
| titleOfInvention | Method of cleaning semiconductor processing device and semiconductor processing device |
| abstract | The ECR plasma CVD apparatus includes a plasma generation chamber into which microwaves and plasma source gas are introduced. An excitation solenoid surrounding the plasma generating chamber and forming an electron cyclotron resonance magnetic field with microwaves is disposed in the plasma generating chamber. In addition, the plasma reaction chamber into which the reactive gas is introduced is provided in communication with the plasma generating chamber. A substrate holder holding a silicon wafer is provided in the plasma reaction chamber. The butterfly valve of the leak type valve which is connected to the plasma reaction chamber and can be freely controlled is installed. The turbomolecular pump is installed at the rear of the butterfly valve. At the rear end of the turbomolecular pump, a subpump is installed through a control valve. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101586237-B1 |
| priorityDate | 1994-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123 |
Total number of triples: 25.