| abstract |
An actinic ray-sensitive or radiation-sensitive resin composition capable of forming an actinic ray-sensitive or radiation-sensitive film excellent in adhesion to a substrate (particularly, adhesion in a dry state) while suppressing a decrease in sensitivity, and the actinic ray-sensitive or Provided are an actinic ray-sensitive or radiation-sensitive film using a radiation-sensitive resin composition, a method for forming a pattern, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin whose polarity is increased by the action of an acid, (B) a photo-acid generator, (P) an amine oxide, and (D) an acid diffusion controller (provided that the amine Excluding those corresponding to oxides), the content of the amine oxide (P) is 0.01 ppm or more and 1000 ppm or less with respect to the total mass of the actinic ray-sensitive or radiation-sensitive resin composition, and the amine oxide (P The mass ratio of the acid diffusion controlling agent (D) to ) is greater than 1 and not more than 10000. |