Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c667003ba24a316013640aa90f658cdc |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2201-09736 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D1-003 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01F41-041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-617 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-423 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-188 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01F5-003 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01F27-2804 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-123 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-165 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01F27-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D7-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01F41-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01F5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-42 |
filingDate |
2019-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d60bdd6ab2176f2d75d82d7ef385b8b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9cae1a0c88f34887f6a33478b578915 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4184c99e4f5562caf0b7b08b5ce4ac1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_735c8ec9f7a4c5e267d248054d263ba3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c0778661612adb8ce930b0bdd06ca2c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b0bee0bcbd62061d5cf8642aa4a35f8 |
publicationDate |
2021-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20210096185-A |
titleOfInvention |
High Aspect Ratio Electroplating Structure and Anisotropic Electroplating Process |
abstract |
The device includes a dielectric layer having a first surface and a second surface. The device also includes a first set of high aspect ratio electroplated structures disposed on a first surface of the dielectric layer and a second set of high aspect ratio electroplated structures disposed on a second surface of the dielectric layer opposite the first set of high aspect ratio electroplated structures. Includes a high aspect ratio electroplated structure. |
priorityDate |
2018-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |