http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210095806-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6038f17109882ad88e9ba8ea907ebb45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-068 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-067 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-02 |
| filingDate | 2021-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_941f15bd3f07c1fe32830785abc4cb92 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e706ec322dcd3029be9f6ba55c50714 |
| publicationDate | 2021-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20210095806-A |
| titleOfInvention | Etching fluid, replenishing fluid, and method for forming copper wiring |
| abstract | The present invention is an etchant for copper, wherein the etchant is an acid, an oxidizing metal ion, a heteroaromatic compound having a 5-membered ring (A), an aliphatic heterocyclic compound having a 5-membered ring (B), and a tertiary or tertiary compound in the molecule The heteroaromatic compound (A) comprising a cationic polymer containing quaternary nitrogen and having a 5-membered ring is a heteroaromatic compound having at least one nitrogen atom as a hetero atom constituting the ring, and the 5 to 7-membered ring The aliphatic heterocyclic compound (B) which has been added to the etching solution which is an aliphatic heterocyclic compound which has one or more nitrogen atoms as a hetero atom which comprises a ring. According to the present invention, the etching solution is excellent in the formation of a fine pattern for a fine pitch pattern area in which the fine part and the rough part are mixed. |
| priorityDate | 2020-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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