| abstract |
An object of the present invention is to provide a film forming material for lithography that can be applied to a wet process, is excellent in heat resistance, flatness of a film on a stepped substrate, solubility in a solvent, and long-term storage stability in a solution form. do. The purpose is, the group of formula (0A): [Formula 1] (In formula (0A), R A and R B are each independently a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.) A film forming material for lithography comprising a compound having a hydrogen atom or an alkyl group having 1 to 4 carbon atoms and a latent curing accelerator. there is. |