http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210038993-A

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filingDate 2019-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28966411de627e71a515c1fda361d974
publicationDate 2021-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20210038993-A
titleOfInvention Limited ring with extended life
abstract A confinement ring for a substrate processing system includes a lower wall, an outer wall, and an upper wall defining a plasma region within the confinement ring. A first plurality of slots are formed in the lower wall. The first plurality of slots provide fluid communication between the plasma region in the confinement ring and the atmosphere outside the confinement ring. A recess is defined in the lower surface of the lower wall. The lower ring is disposed in the recess of the lower surface. The lower ring includes a second plurality of slots that provide fluid communication between the plasma region in the confinement ring and the atmosphere outside the confinement ring through the first plurality of slots.
priorityDate 2018-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 28.