| abstract |
In an exemplary embodiment, a top-selective deposition method using a flowable carbon-based film on a substrate having a concave portion defined by an upper surface, a sidewall, and a lower portion comprises: (i) the thickness of the flowable carbon-based film in the concave portion is predetermined. Depositing a flowable carbon-based film in the concave portion of the substrate in the reaction space until the thickness is reached, and then stopping the deposition; And (ii) exposing the carbon-based film to a nitrogen plasma in an atmosphere substantially free of hydrogen and oxygen in order to selectively redeposit the carbon-based film on the upper surface. |