http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210007039-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2a9477fa547774350cb8ec4b9ca87477 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3137 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3151 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-08 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0234 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2014-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7f383bcd5579f1853d40c95e58d6f4a |
| publicationDate | 2021-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20210007039-A |
| titleOfInvention | Method and device for the surface treatment of substrates |
| abstract | The present invention relates to a method for surface-treating the substrate surface 7o of the substrate 7, the method comprising Arranging the substrate surface 7o in the process chamber 8, Ion beams (3, 3', 3) having a first component, generated by an ion beam source (2, 2', 2") and directed towards the substrate surface (7o) to remove impurities from the substrate surface (7o) Impinging the substrate surface 7o with "), And introducing a second component into the process chamber 8 to bind the removed impurities. Further, the present invention relates to an apparatus for surface-treating the substrate surface 7o of the substrate 7, wherein the apparatus comprises Comprising a process chamber (8) for receiving a substrate (7), Ion beam sources (2, 2', 2) for generating ion beams (3, 3', 3") having a first component facing the substrate surface (7o) to remove impurities from the substrate surface (7o) Includes "), Characterized in that it comprises means for introducing a second component into the process chamber 8 to bind the removed impurities. |
| priorityDate | 2014-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.