| abstract |
[Task] In the semiconductor device manufacturing process, in order to prevent defects occurring on the semiconductor substrate after formation of the resist pattern or after processing the semiconductor substrate, in the lithography process, before passing the liquid for lithography into the semiconductor manufacturing apparatus. , In order to remove metal impurities, etc. existing in a portion of the chemical liquid passing through, a cleaning liquid for effectively removing these impurities is provided. [Solution means] It is a cleaning liquid for cleaning the liquid-passing portion of a lithography chemical solution in a semiconductor manufacturing apparatus used in a lithography process of semiconductor manufacturing, containing an inorganic acid, water, and a hydrophilic organic solvent. The concentration of the inorganic acid in the cleaning solution is preferably 0.0001% by mass to 60% by mass based on the total amount of the cleaning solution. |