http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200137448-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cd75bebe3b375c0b208631e4bb176ed0 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-48714 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-3278 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02178 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-487 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-327 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-30 |
| filingDate | 2019-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c5b1cb2cb4886942e3d120d02d1a70d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb2bcc75251633895a573ef4ae90834e |
| publicationDate | 2020-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20200137448-A |
| titleOfInvention | Nanoporous 3d carbon electrode-based heavy metal sensor and method for manufacturing thereof |
| abstract | The present invention relates to a heavy metal sensor and a method of manufacturing the same. According to the present invention, (a) depositing an insulating layer on the upper surface of a silicon substrate, (b) coating a negative photoresist on the insulating layer deposited by the (a) step, (c) the (b) Exposing the negative photoresist coated by the step) to ultraviolet light, (d) additionally coating a negative photoresist on the negative photoresist exposed in the step (c), (e) in the step (d) Exposing the coated negative photoresist to ultraviolet rays, (f) performing a treatment of developing the negative photoresist exposed in steps (c) and (e) to perform a layered photo of a layered structure including a plurality of 3D microstructures Forming a resist polymer structure, (g) forming a porous structure on the polymer structure formed by step (f) using an oxygen plasma etching equipment, (h) a porous polymer formed by step (g) Converting the structure to a porous 3D carbon structure by pyrolyzing the structure, (i) depositing an insulating layer on the converted porous carbon electrode, (j) coating a positive photoresist on the insulating layer formed in step (i) Steps, (k) exposing the photoresist coated in step (j) to ultraviolet light, (l) developing the photoresist exposed in step (k), (m) exposing in step (l) And removing the formed insulating layer by etching, (n) removing the positive photoresist, and (o) applying bismuth nanoparticles in the form of branches to the patterned porous carbon electrode. |
| priorityDate | 2019-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 39.