Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3341 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
filingDate |
2019-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8c7744ea74a02d512cac334e8420fe2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd369911f21ddb96c8397e76fc5ccc67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9252f547791dac1e7fdfb957e3137433 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f25d567720eed2d5dc2ac30c2e6eec98 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08235a711b9f91eecaa6852bc5097dd7 |
publicationDate |
2020-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20200131432-A |
titleOfInvention |
Shower head assembly and plasma processing apparatus having the same |
abstract |
The shower head assembly for a plasma processing apparatus is provided on a shower plate having injection holes for injecting gas toward a substrate on a substrate stage inside a chamber, and a lower surface of the shower plate facing the substrate, and A first compensating portion covering a portion and having first gas passages having a first length in communication with the injection hole, and a second length covering a second portion of the lower surface and being larger than the first length in communication with the injection hole And a compensation plate including a second compensation unit having second gas passages of. |
priorityDate |
2019-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |