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publicationDate 2020-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20200131432-A
titleOfInvention Shower head assembly and plasma processing apparatus having the same
abstract The shower head assembly for a plasma processing apparatus is provided on a shower plate having injection holes for injecting gas toward a substrate on a substrate stage inside a chamber, and a lower surface of the shower plate facing the substrate, and A first compensating portion covering a portion and having first gas passages having a first length in communication with the injection hole, and a second length covering a second portion of the lower surface and being larger than the first length in communication with the injection hole And a compensation plate including a second compensation unit having second gas passages of.
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