| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_985f1bf0df4204078e687f8417dc5871
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4a557b00249a3ad2c171dc22fe67010c |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6835 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2019-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ac9b136b85695b661ffb63ca55c5acb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_547ee72c0c0aa7d30846be629e9d7496 |
| publicationDate |
2020-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20200126705-A |
| titleOfInvention |
A support unit, a substrate processing apparatus including the same, and a method of manufacturing the support unit |
| abstract |
The present invention provides an apparatus for processing a substrate. An apparatus for processing a substrate includes: a housing having a processing space formed therein; A support unit supporting a substrate in the processing space; And, a plasma generating unit that generates plasma from the process gas and supplies the generated plasma to the processing space, wherein the support unit includes: a lower electrode to which power is applied; In addition, it is provided on the lower electrode and includes an insulating layer on which the substrate is placed, and the lower electrode may be provided with different heights of the upper end of the center region and the upper end of the edge region when viewed from a longitudinal section thereof. . |
| priorityDate |
2019-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |