http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200117074-A

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filingDate 2010-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b4ccd24ad666c4a3d3c26f351768e7a
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publicationDate 2020-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20200117074-A
titleOfInvention Radio frequency (rf) ground return arrangements
abstract An apparatus for confining a plasma within a plasma processing chamber is provided. The plasma processing chamber includes a lower electrode for supporting a substrate and an upper electrode disposed over the lower electrode. The device is a confinement ring, comprising a lower horizontal section extending between an inner lower radius and an outer radius of the confinement ring. The lower horizontal section includes an extending section bending vertically downward in the inner lower radius, and the lower horizontal section further includes a plurality of slots. The confinement ring further comprises an upper horizontal section extending between an inner upper radius and an outer radius of the confinement ring, and a vertical section integrally connecting the lower horizontal section with the upper horizontal section. The extended section of the lower horizontal section is configured to surround the lower electrode when installed in the plasma processing chamber.
priorityDate 2009-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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