| abstract |
[Problem] A negative resist composition with high sensitivity and capable of reducing the LWR or CDU of a pattern and forming a good shape, and a resist pattern forming method using the composition are provided. [Solution means] (A) a quencher containing an onium salt represented by the following formula (A-1), (B) a base polymer containing a repeating unit represented by the following formula (B1) and the following formula (B2), and (C) A chemically amplified negative resist composition comprising a photoacid generator that generates an acid. (In the formula, R 1 to R 6 , Rf 1 to Rf 2 , R 11 , R 12 , R A , Rx, Ry, W 1 is a specific substituent, A 1 is a single bond or a linking group, and m is 1 to 5 , n is 0≤n≤5-m, p is 0-1, x 1 is 0-2, b and d are integers of 1 to 3. t 1 is 0 or 1. a is 0≤a≤5 It is an integer that satisfies +2x 1 -b, and c is an integer that satisfies 0≤c≤5+2x 1 -d.) |