abstract |
(A) component: resin having phenolic hydroxyl group, (B) component: aliphatic or alicyclic epoxy compound having two or more oxirane rings, (C) component: photosensitive acid generator, and (D) component: It provides a photosensitive resin composition characterized by containing 20-70 mass parts of said (B) component with respect to 100 mass parts of said (A) component with the photosensitive resin composition containing a solvent. |