http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200076614-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32183 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2019-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b12df0e39c8360034b5b3befe49f192 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31f0176c5a39353f6a71df3082c29caa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd387bf696d3166b630a637a35eca73d |
| publicationDate | 2020-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20200076614-A |
| titleOfInvention | Plasma processing apparatus, impedance matching method, and plasma processing method |
| abstract | [Problem] A plasma processing apparatus capable of efficiently supplying ions having a desired ion energy to a substrate is provided. [Solution] In the plasma processing apparatus according to one exemplary embodiment, the first high-frequency power source is connected to the lower electrode of the substrate support provided in the chamber through the first matcher. The first high frequency power supply supplies the first high frequency power for bias to the lower electrode. The second high frequency power supply is connected to the load through the second matcher. The second high frequency power supply supplies the second high frequency power for plasma generation to the load. The controller of the second matching device sets the impedance of the matching circuit of the second matching device in order to reduce the reflection from the load of the second high frequency power supply in the specified partial period within each period of the first high frequency power. |
| priorityDate | 2018-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16217673 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449789534 |
Total number of triples: 19.