http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200066156-A

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filingDate 2019-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0bba7613c31bf8577906596a1105d313
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publicationDate 2020-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20200066156-A
titleOfInvention Substrate processing method
abstract [Problem] A technique for controlling a pattern formed on a substrate to a desired state is provided. [Solutions] The substrate processing method includes a step of providing a substrate to be processed having a pattern, a step of depositing a film on the substrate, a step of forming a reaction layer by plasma on the surface of the substrate, and energy of the substrate. And removing the reaction layer.
priorityDate 2018-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 36.