| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d51b723a2d8eb04c7a282a4cc006b70a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 |
| filingDate |
2018-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e3f45c91a1f01e036c1ea84899ec4f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83f934ef2cc0c25ffa1798055bb59636
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a362289c6d414130343cc8fbf12d571 |
| publicationDate |
2020-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20200064232-A |
| titleOfInvention |
Apparatus for Depositing Thin Film and Method of Depositing The Thin Film |
| abstract |
It is a technology for a thin film deposition apparatus and method. The thin film deposition method according to the present embodiment includes supplying a source gas into a process chamber in which a processing space is formed; Supplying a reaction gas into the process chamber; And generating a plasma in the process chamber so that the source gas and the reaction gas react to deposit a thin film on a substrate, and in the reaction gas supply step, the reaction gas supplied to the process chamber The supply flow rate can be variably supplied. |
| priorityDate |
2018-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |