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filingDate 2000-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3bc54f91681f57a3cf9589ddc89075de
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publicationDate 2002-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20020054907-A
titleOfInvention Plasma deposition apparatus and method for forming deposition layer using it
abstract The present invention discloses a plasma deposition apparatus and a deposition film forming method using the same. The present invention disclosed is a reactor including a heater block and a gas exhaust port on which a silicon wafer is mounted, a diffuser formed in an upper portion of the reactor and connected to a high frequency generator and a filter from ground, respectively, and connected to the diffuser. A plasma deposition apparatus comprising a gas injection tube for injecting a reaction gas from the outside of a reactor, the apparatus comprising a power supply connected to the heater block and emitting an electric field having a vertical component in the thickness direction of the silicon wafer. do. Thereby, the vapor deposition film which has a uniform profile can be formed.
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priorityDate 2000-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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