Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5128cfc84a0fb189fceb3cd240c44493 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 |
filingDate |
2018-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33feb1d6ee6d5be35d6b92488098b03b |
publicationDate |
2020-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20200062363-A |
titleOfInvention |
Photosensitive resin laminate |
abstract |
There is provided a photosensitive resin laminate that avoids the occurrence of resist projections, gives a good resist pattern shape, and is obtained with good productivity. In one aspect, as a photosensitive resin laminate comprising a support film and a photosensitive resin composition layer formed on the support film, the support film contains fine particles, and the support film is an area of 13.5 mm 2 by a laser beam microscope A photosensitive resin laminate is provided that includes a region in which the total area ratio of the optical abnormal region when observed at is 300 ppm or less. |
priorityDate |
2017-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |