| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d51b723a2d8eb04c7a282a4cc006b70a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2018-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_084ba7b561bb9b88d0a4c4b52f8bbaaf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bebb93f9b34c07021a8a3797b42d99f4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c42d41f8247273a566ab99ab66ce9fa |
| publicationDate |
2020-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20200061833-A |
| titleOfInvention |
Apparatus and method for processing substrate |
| abstract |
A substrate processing method according to an embodiment of the present invention includes a source gas adsorption step of adsorbing a source gas on a substrate by supplying a source gas in the process chamber; A first purge step of purging the source gas; A reaction step of forming a thin film on the substrate by supplying a reaction gas into the process chamber; A second purge step of purging the reaction gas; And an inert gas supply step of supplying an inert gas to a waveguide connecting the cleaning gas supply part and the gas injection part in at least one purge step of the first purge step and the second purge step. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022260476-A1 |
| priorityDate |
2018-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |