| abstract |
[Task] An object of the present invention is to provide a salt capable of producing a resist pattern having good CD uniformity (CDU) and a resist composition containing the salt. [Solutions] Salts represented by formula (I). [In formula (I), R 1 , R 2 and R 3 each independently represent a halogen atom, a perfluoroalkyl group having 1 to 6 carbon atoms, or a hydrocarbon group having 1 to 12 carbon atoms, and -CH 2 -contained in the hydrocarbon group is -O- Or it may be substituted by -CO-. m1 represents an integer from 0 to 4, and when m1 is 2 or more, a plurality of R 1 may be the same or different from each other. m2 represents an integer from 0 to 4, and when m2 is 2 or more, a plurality of R 2 may be the same or different from each other. m3 represents an integer from 0 to 4, and when m3 is 2 or more, a plurality of R 3 may be the same or different from each other.] |